Asset Details

  • Description:
  • AFM height images of PSA thin films on silicon wafers after different degradation times (sample thickness at 0 h: 166 nm). Scale bars: 1 µm. Roughness values Rq are given underneath the images. Left to right: a) at 0 h, b) 2 h, c) 24 h, and d) 48 h.
  • License:
  • Rights Managed
  • Rights Holder:
  • John Wiley & Sons, Inc.
  • License Rights Holder:
  • © 2019 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim
  • Asset Type:
  • Image
  • Asset Subtype:
  • Figure
  • Image Orientation:
  • Landscape
  • Image Dimensions:
  • 1000 x 244
  • Image File Size:
  • 254 KB
  • Creator:
  • Zhuoling Deng, Alexander Schweigerdt, Alexander Norow, Karen Lienkamp
  • Credit:
  • Deng, Z., Schweigerdt, A., Norow, A., & Lienkamp, K. (2019). Degradation of Polymer Films on Surfaces: A Model Study with Poly(sebacic anhydride) Macromolecular Chemistry and Physics, 220(15), n/a. https://doi.org/10.1002/macp.201900121.
  • Collection:
  • Keywords:
  • Restrictions:
  • Property Release:
  • No
  • Model Release:
  • No
  • Purchasable:
  • Yes
  • Sensitive Materials:
  • No
  • Article Authors:
  • Zhuoling Deng, Alexander Schweigerdt, Alexander Norow, Karen Lienkamp
  • Article Copyright Year:
  • 2019
  • Publication Volume:
  • 220
  • Publication Issue:
  • 15
  • Publication Date:
  • 08/01/2019
  • DOI:
  • https://doi.org/10.1002/macp.201900121

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